SnO2 thin film parameter influence on gas sensitive characteristics

DMITRIEV, S.; BRYNZARI, V.; KOROTCHENKOV, G.

dc.contributor.author	DMITRIEV, S.
dc.contributor.author	BRYNZARI, V.
dc.contributor.author	KOROTCHENKOV, G.
dc.date.accessioned	2020-09-17T13:04:11Z
dc.date.available	2020-09-17T13:04:11Z
dc.date.issued	2005
dc.identifier.citation	DMITRIEV, S., BRYNZARI, V., KOROTCHENKOV, G. SnO2 thin film parameter influence on gas sensitive characteristics. In: Moldavian Journal of the Physical Sciences. 2005, vol. 4 (1), pp. 102-105. ISSN 1810-648X.	en_US
dc.identifier.issn	1810-648X
dc.identifier.uri	http://repository.utm.md/handle/5014/9555
dc.description.abstract	In this report we present results of investigation of influence of the parameters of SnO2 thin film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method. The influence of technologic parameters on concentration of free electrons n, stoichiometry, thickness d and gas sensitivity S=Rgas/Rair was investigated by means of electrophysical, IR-spectroscopy and SIMS measurements. It was established that optimal spray solution s composition is 0.2M, which allows depositing of SnO2 films with required parameters: n-1018-1019 cm-3, R=105-106 and S>10 correspondently. Obtained results on gas sensitivity are compared with results of theoretical considerations.	en_US
dc.language.iso	en	en_US
dc.publisher	Academy of Sciences of Moldova	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	films	en_US
dc.subject	thin films	en_US
dc.subject	electrons	en_US
dc.title	SnO2 thin film parameter influence on gas sensitive characteristics	en_US
dc.type	Article	en_US