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Gas sensing characterization of tellurium thin films by the Kelvin probe technique

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dc.contributor.author TSIULYANU, D.
dc.contributor.author MARIAN, S.
dc.contributor.author MOCREAC, O.
dc.date.accessioned 2020-09-17T11:26:10Z
dc.date.available 2020-09-17T11:26:10Z
dc.date.issued 2012
dc.identifier.citation TSIULYANU, D., MARIAN, S., MOCREAC, O. Gas sensing characterization of tellurium thin films by the Kelvin probe technique. In: Moldavian Journal of the Physical Sciences. 2012, vol. 11 (3), pp. 264-271. ISSN 1810-648X. en_US
dc.identifier.issn 1810-648X
dc.identifier.uri http://repository.utm.md/handle/5014/9539
dc.description.abstract The sensing behavior of tellurium films at room temperature was tested with environmental pollutant gases, such as NO2, CO, O3, and water vapor, using the Kelvin probe technique. A significant sensitivity was observed for nitrogen dioxide. The detection range for NO2 was between 0.5–5.0 ppm in air with controlled humidity. The response and the recovery time are rapid with good reproducibility and high sensibility. The work function measurements showed that chalcogenide semiconductors in question are well-suited materials for the detection of not only small concentrations of NO2, but also for humidity sensing. The relative humidity of 45% induces the work function change of approximately 200 mV at room temperature. It is shown that the “strong” chemisorption of nitrogen dioxide results in an increase in both work function change and electrical conductivity because of the additional charging of the surface and band bending. The effect of water vapor is due to a simple physical adsorption of polar water molecules oriented perpendicular to the surface with a negative pole inward. en_US
dc.language.iso en en_US
dc.publisher Academy of Sciences of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject semiconductors en_US
dc.subject chalcogenide semiconductors en_US
dc.subject tellurium thin films en_US
dc.title Gas sensing characterization of tellurium thin films by the Kelvin probe technique en_US
dc.type Article en_US


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