Impedance Spectroscopy as a Powerful Tool for Better Understanding and Controlling the Pore Growth Mechanism in Semiconductors

COJOCARU, A.; FOCA, E.; CARSTENSEN, J.; LEISNER, M.; TIGINYANU, I. M.; FÖLL, H.

dc.contributor.author	COJOCARU, A.
dc.contributor.author	FOCA, E.
dc.contributor.author	CARSTENSEN, J.
dc.contributor.author	LEISNER, M.
dc.contributor.author	TIGINYANU, I. M.
dc.contributor.author	FÖLL, H.
dc.date.accessioned	2020-11-09T11:50:32Z
dc.date.available	2020-11-09T11:50:32Z
dc.date.issued	2009
dc.identifier.citation	COJOCARU, A., FOCA, E., CARSTENSEN, J. et al. Rayleigh scattering of a metal nanoparticle on a flat dielectric surface. In: Nanoscale Phenomena. NanoScience and Technology, 2009, pp. 139-144. ISBN 978-3-642-00707-1.	en_US
dc.identifier.uri	https://doi.org/10.1007/978-3-642-00708-8_13
dc.identifier.uri	http://repository.utm.md/handle/5014/11234
dc.description	Acces ful text: https://doi.org/10.1007/978-3-642-00708-8_13	en_US
dc.description.abstract	This work shows new results towards a better understanding of macropore growth in semiconductor phenomenology by using in-situ FFT impedance spectroscopy. A new interpretation of the voltage impedance is proposed. In particular, the pore quality could be quantified for the first time in-situ, especially by extracting the valence of the electrochemical process. The study paves the way towards an automatized etching system where the pore etching parameters are adjusted in-situ during the pore etching process.	en_US
dc.language.iso	en	en_US
dc.publisher	Springer, Berlin, Heidelberg	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	impedance spectroscopy	en_US
dc.subject	macropores	en_US
dc.subject	electrochemical etching	en_US
dc.title	Impedance Spectroscopy as a Powerful Tool for Better Understanding and Controlling the Pore Growth Mechanism in Semiconductors	en_US
dc.type	Article	en_US