Direct relief formation during holographic recording in nanomultilayers As2S3/Se

TRIDUH, G.; PRISACAR, A.; MESHALKIN, A.; ABASHKIN, V.; ACHIMOVA, E.; ENAKI, M.

dc.contributor.author	TRIDUH, G.
dc.contributor.author	PRISACAR, A.
dc.contributor.author	MESHALKIN, A.
dc.contributor.author	ABASHKIN, V.
dc.contributor.author	ACHIMOVA, E.
dc.contributor.author	ENAKI, M.
dc.date.accessioned	2020-09-08T06:24:41Z
dc.date.available	2020-09-08T06:24:41Z
dc.date.issued	2014
dc.identifier.citation	TRIDUH, G., PRISACAR, A., MESHALKIN, A. et al. Direct relief formation during holographic recording in nanomultilayers As2S3/Se. In: Materials Science and Condensed Matter Physics: mater. a 7-a conf. intern., 16-19 septembrie, 2014. Chişinău, 2014, p. 211.	en_US
dc.identifier.uri	http://repository.utm.md/handle/5014/9267
dc.description	Sursa: Conferința –"Materials Science and Condensed Matter Physics", Chișinău, Moldova, 16-19 septembrie 2014.→ https://ibn.idsi.md/collection_view/169	en_US
dc.description.abstract	The process of obtaining of high-efficiency relief holographic gratings includes laser irradiation and chemical etching of photosensitive film in a special selective solution. This process can be greatly enhanced by the use of recording media that can change its thickness in the process of light exposure. This eliminates the chemical treatment process in obtaining of relief-phase gratings. The aim of this work was to study the process of direct relief formation of holographic gratings in multilayer structures As2S3/Se.	en_US
dc.language.iso	en	en_US
dc.publisher	Academia de Ştiinţe a Moldovei	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	photosensitive films	en_US
dc.subject	films	en_US
dc.subject	multilayer structures	en_US
dc.title	Direct relief formation during holographic recording in nanomultilayers As2S3/Se	en_US
dc.type	Article	en_US