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Microtechnology with SILAR and RPP for semiconductor oxide gas sensors

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dc.contributor.author SHISHIYANU, S. T.
dc.contributor.author SHISHIYANU, T. S.
dc.contributor.author LUPAN, O. I.
dc.date.accessioned 2020-08-24T12:05:35Z
dc.date.available 2020-08-24T12:05:35Z
dc.date.issued 2005
dc.identifier.citation SHISHIYANU, S. T., SHISHIYANU, T. S., LUPAN, O. I. Microtechnology with SILAR and RPP for semiconductor oxide gas sensors. In: International Semiconductor Conference: proceed., 3-5 Oct. 2006, Sinaia, 2005, V. 1, p. 205-208. ISBN 0-7803-9214-0. en_US
dc.identifier.isbn 0-7803-9214-0
dc.identifier.uri https://doi.org/10.1109/SMICND.2005.1558748
dc.identifier.uri http://repository.utm.md/handle/5014/9119
dc.description Access full text - https://doi.org/10.1109/SMICND.2005.1558748 en_US
dc.description.abstract Microtechnology with Successive Ionic Layer Adsorption and Reaction (SILAR) technique and rapid photothermal processing (RPP) was elaborated and applied for semiconductor oxides gas sensors. The experimental results shown that by RPP is possible to control the surface morphology, photoluminescence, sensing properties and operating temperature of impurity doped zinc oxide thin films. The highest sensitivity to 1.5 ppm NO/sub 2/ was obtained for 5 - 10 at.% Sn concentration in the solution of ions and RPP temperature of 550-650/spl deg/C. en_US
dc.language.iso en en_US
dc.publisher Institute of Electrical and Electronics Engineerings, IEEE en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject gas sensors en_US
dc.subject adsorption en_US
dc.subject photothermal effects en_US
dc.subject surface morphology en_US
dc.subject photoluminescence en_US
dc.subject zinc compounds en_US
dc.subject semiconductors en_US
dc.subject impurities en_US
dc.subject semiconductor oxide gas sensors en_US
dc.subject photothermal processing en_US
dc.subject surface morphology en_US
dc.subject gas detectors en_US
dc.subject zinc oxide en_US
dc.subject tin en_US
dc.subject thin film sensors en_US
dc.subject surface morphology en_US
dc.subject temperature sensors en_US
dc.subject substrates en_US
dc.subject sputtering en_US
dc.subject glass en_US
dc.subject scanning electron microscopy en_US
dc.title Microtechnology with SILAR and RPP for semiconductor oxide gas sensors en_US
dc.type Article en_US


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