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Hardness of the Cu thin films grown on the MgO substrate

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dc.contributor.author GRABCO, D.
dc.contributor.author PYRTSAC, C.
dc.contributor.author GHIMPU, L.
dc.date.accessioned 2021-11-03T12:43:30Z
dc.date.available 2021-11-03T12:43:30Z
dc.date.issued 2014
dc.identifier.citation GRABCO, D., PYRTSAC, C., GHIMPU, L. Hardness of the Cu thin films grown on the MgO substrate. In: Materials Science and Condensed Matter Physics: proc., Ed. 7, 16-19 septembrie 2014, Chişinău, Moldova, 2014, pp. 156. en_US
dc.identifier.uri http://repository.utm.md/handle/5014/17876
dc.description.abstract In this paper we studied the mechanical propeties of Cu thin films grown on MgO ( 4) substrate. The Cu films were obtained by the method of magnetron sputtering (with Magnetron Sputtering RF) at room temperature with thickness t=85 (I), 470 (2), 1000 (3) nm. The roughness, Ra, of the surface of thin films was estimated using the atomic force microscope and optical microscopes. en_US
dc.language.iso en en_US
dc.publisher Institutul de Fizică Aplicată al AŞM en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject films en_US
dc.subject thin films en_US
dc.title Hardness of the Cu thin films grown on the MgO substrate en_US
dc.type Article en_US


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