Peculiarities of Ultrathin Amorphous and Nanostructured Te Thin Films by Gas Sensing

TSIULYANU, D.; MOCREAC, O.; CIOBANU, M.; ENACHI, M.; VOLODINA, G.

dc.contributor.author	TSIULYANU, D.
dc.contributor.author	MOCREAC, O.
dc.contributor.author	CIOBANU, M.
dc.contributor.author	ENACHI, M.
dc.contributor.author	VOLODINA, G.
dc.date.accessioned	2021-01-26T15:15:38Z
dc.date.available	2021-01-26T15:15:38Z
dc.date.issued	2014
dc.identifier.citation	TSIULYANU, D., MOCREAC, O., CIOBANU, M. Peculiarities of Ultrathin Amorphous and Nanostructured Te Thin Films by Gas Sensing. In: Journal of Nanoelectronics and Optoelectronics. 2014, vol. 9, nr. 23, pp. 282-286. ISSN 1555-130X (print), eISSN: 1555-131.	en_US
dc.identifier.uri	https://doi.org/10.1166/jno.2014.1585
dc.identifier.uri	http://repository.utm.md/handle/5014/12578
dc.description	Access full text - https://doi.org/10.1166/jno.2014.1585	en_US
dc.description.abstract	The extinction of sensitivity to nitrogen dioxide induced by high gas concentration have been observed in ultrathin tellurium films. The phenomenon becomes apparent in both continuous and nanostructured films shown by AFM, SEM and XRD analyses to be in amorphous state. Sensitivity of 30 nm thick Te film decreases near linearly with concentration increase between 150 and 500 ppb of the nitrogen dioxide. The results are explained in terms of formation of a nitrogen dioxide catalytic gate in which a molecule adsorbs (and desorbs) without reacting.	en_US
dc.language.iso	en	en_US
dc.publisher	American Scientific Publishers	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	nitrogen dioxide	en_US
dc.subject	ultrathin films	en_US
dc.subject	tellurium films	en_US
dc.subject	films	en_US
dc.title	Peculiarities of Ultrathin Amorphous and Nanostructured Te Thin Films by Gas Sensing	en_US
dc.type	Article	en_US