Chalcogenide glassy-based photoresists for microelectronics

TSIULYANU, D. I.

dc.contributor.author	TSIULYANU, D. I.
dc.date.accessioned	2021-01-21T14:11:30Z
dc.date.available	2021-01-21T14:11:30Z
dc.date.issued	1995
dc.identifier.citation	TSIULYANU, D. I. Chalcogenide glassy-based photoresists for microelectronics. In: International Conference on Microelectronics, 12-14 Sept. 1995, Nis, Serbia: proceedings, 1995, V. 1, pag. 134-137. ISBN 0-7803-2786-1.	en_US
dc.identifier.isbn	0-7803-2786-1
dc.identifier.uri	https://doi.org/10.1109/ICMEL.1995.500829
dc.identifier.uri	http://repository.utm.md/handle/5014/12527
dc.description	Acces full text: https://doi.org/10.1109/ICMEL.1995.500829	en_US
dc.description.abstract	Possibilities of application in microelectronics of chalcogenide glassy semiconductors (ChGS) as inorganic high-resolution photoresists is treated. A brief consideration of three main effects: photostructural transformations, photo-doping and electrostimulated interaction of ChGS with some metals for lithography is given. The emphasis is put on the third effect which appears to be original and less known as well as on the technical features of lithography processes with ChGS.	en_US
dc.language.iso	en	en_US
dc.publisher	IEEE	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	semiconductors	en_US
dc.subject	chalcogenides	en_US
dc.title	Chalcogenide glassy-based photoresists for microelectronics	en_US
dc.type	Article	en_US