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dc.contributor.author COJOCARI, O.
dc.contributor.author OPREA, I.
dc.contributor.author SYDLO, C.
dc.contributor.author ZIMMERMANN, R.
dc.contributor.author WALBER, A.
dc.contributor.author HENNEBERGER, R.
dc.contributor.author HARTNAGEL, H.-L.
dc.date.accessioned 2021-01-21T08:26:43Z
dc.date.available 2021-01-21T08:26:43Z
dc.date.issued 2005
dc.identifier.citation COJOCARI, O., OPREA, I., SYDLO, C. et al. THz Schottky diodes on epitaxial AlGaAs-membrane. In: Joint 32nd International Conference on Infrared and Millimeter Waves and the 15th International Conference on Terahertz Electronics, 2-9 Sept. 2007, Cardiff, UK: proceedings, p. 746-747. ISBN 978-1-4244-1438-3. en_US
dc.identifier.isbn 978-1-4244-1438-3
dc.identifier.uri https://doi.org/10.1109/ICIMW.2007.4516711
dc.identifier.uri http://repository.utm.md/handle/5014/12517
dc.description Acces full text: https://doi.org/10.1109/ICIMW.2007.4516711 en_US
dc.description.abstract Schottky structures based on quasi-vertical diode (QVD) design concept are essentially improved by optimization of the GaAs/AlGaAs wafer layout and fabrication process. Insertion of a 4 mum-thin epitaxial AlGaAs layer permits more accurate micromachining of the membrane-substrate without significant degradation of anode parameters. This greatly improved repeatability and increased the yield of the fabrication process. New technology tolerances allowed further optimization of structure geometry, which in turn led to achievement of state-of-the-art mixer performance at millimeter-waves. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject Schottky structures en_US
dc.subject quasi-vertical diodes en_US
dc.subject diodes en_US
dc.subject epitaxial membranes en_US
dc.subject membranes en_US
dc.title THz Schottky diodes on epitaxial AlGaAs-membrane en_US
dc.type Article en_US


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