Polysilicon thin layers for photovoltaic applications

BUDIANU, E.; PURICA, M.; RUSU, E.; MANEA, E.; GAVRILA, R.

dc.contributor.author	BUDIANU, E.
dc.contributor.author	PURICA, M.
dc.contributor.author	RUSU, E.
dc.contributor.author	MANEA, E.
dc.contributor.author	GAVRILA, R.
dc.date.accessioned	2021-01-13T18:02:11Z
dc.date.available	2021-01-13T18:02:11Z
dc.date.issued	2002
dc.identifier.citation	BUDIANU, E., PURICA, M., RUSU, E. et al. Polysilicon thin layers for photovoltaic applications. In: International Semiconductor Conference: proceedings, 8-12 Oct. 2002, Sinaia, Romania, 2002, pp. 215-218.	en_US
dc.identifier.uri	https://doi.org/10.1109/SMICND.2002.1105834
dc.identifier.uri	http://repository.utm.md/handle/5014/12434
dc.description	Acces full text: https://doi.org/10.1109/SMICND.2002.1105834	en_US
dc.description.abstract	Thin layers of polycrystalline silicon as the optically absorbing material for photovoltaic devices represents a promising way for simultaneously achieving good performances and low manufacturing cost. In this paper, the preparation of polysilicon thin layers together with technological process for a p-i-n type photovoltaic cell fabrication are presented. The crystalline structure, surface morphology and optical properties were investigated by AFM technique, X-ray diffraction and spectrophotometer measurements.	en_US
dc.language.iso	en	en_US
dc.publisher	IEEE	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	thin layers	en_US
dc.subject	layers	en_US
dc.subject	polycrystalline silicon	en_US
dc.subject	silicon	en_US
dc.subject	photovoltaic devices	en_US
dc.title	Polysilicon thin layers for photovoltaic applications	en_US
dc.type	Article	en_US