dc.contributor.author | URSAKI, V. V. | |
dc.contributor.author | TIGINYANU, I. M. | |
dc.contributor.author | ZALAMAI, V. V. | |
dc.contributor.author | HUBBARD, S. M. | |
dc.contributor.author | PAVLIDIS, D. | |
dc.date.accessioned | 2020-11-12T09:54:30Z | |
dc.date.available | 2020-11-12T09:54:30Z | |
dc.date.issued | 2003 | |
dc.identifier.citation | URSAKI, V. V., TIGINYANU, I. M., ZALAMAI, V. V. et al. Optical characterization of AlN/GaN heterostructures. In: Journal of Applied Physics, 2003, V. 94, Nr. 8, pp. 4813-4818. ISSN 0021-8979 (print); 1089-7550 (web). | en_US |
dc.identifier.uri | https://doi.org/10.1063/1.1609048 | |
dc.identifier.uri | http://repository.utm.md/handle/5014/11360 | |
dc.description | Access full text - https://doi.org/10.1063/1.1609048 | en_US |
dc.description.abstract | AlN/GaN/sapphire heterostructures with AlN gate film thickness of 3–35 nm are characterized using photoreflectivity (PR) and photoluminescence (PL) spectroscopy. Under a critical AlN film thickness, the luminescence from the GaN channel layer near the interface proves to be excitonic. No luminescence related to the recombination of the two-dimensional electron gas (2DEG) is observed, in spite of high 2DEG parameters indicated by Hall-effect measurements. The increase of the AlN gate film thickness beyond a critical value leads to a sharp decrease in exciton resonance in PR and PL spectra as well as to the emergence of a PL band in the 3.40–3.45 eV spectral range. These findings are explained taking into account the formation of defects in the GaN channel layer as a result of strain-induced AlN film cracking. A model of electronic transitions responsible for the emission band involved is proposed. | en_US |
dc.language.iso | en | en_US |
dc.publisher | American Institute of Physics | en_US |
dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.subject | heterostructures | en_US |
dc.subject | gate films | en_US |
dc.subject | films | en_US |
dc.subject | photoreflectivity | en_US |
dc.subject | photoluminescence | en_US |
dc.subject | luminescence | en_US |
dc.subject | channel layers | en_US |
dc.title | Optical characterization of AlN/GaN heterostructures | en_US |
dc.type | Article | en_US |
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