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Luminescence of GaN nanocolumns obtained by photon-assisted anodic etching

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dc.contributor.author TIGINYANU, I. M.
dc.contributor.author URSAKI, V. V.
dc.contributor.author ZALAMAI, V. V.
dc.contributor.author LANGA, S.
dc.contributor.author HUBBARD, S.
dc.contributor.author PAVLIDIS, D.
dc.contributor.author FÖLL, H.
dc.date.accessioned 2020-11-10T09:03:14Z
dc.date.available 2020-11-10T09:03:14Z
dc.date.issued 2003
dc.identifier.citation TIGINYANU, I. M. URSAKI, V. V. ZALAMAI, V. V. et al. Luminescence of GaN nanocolumns obtained by photon-assisted anodic etching. In: Applied Physics Letters, 2003, V. 83, Nr. 8, pp. 1551-1553. ISSN 0003-6951. en_US
dc.identifier.uri https://doi.org/10.1063/1.1605231
dc.identifier.uri http://repository.utm.md/handle/5014/11273
dc.description Access full text - https://doi.org/10.1063/1.1605231 en_US
dc.description.abstract GaN nanocolumns with transverse dimensions of about 50 nm were obtained by illumination-assisted anodic etching of epilayers grown by metalorganic chemical vapor deposition on sapphire substrates. The photoluminescence spectroscopy characterization shows that the as-grown bulk GaN layers suffer from compressive biaxial strain of 0.5 GPa. The majority of nanocolumns are fully relaxed from strain, and the room-temperature luminescence is free excitonic. The high quality of the columnar nanostructures evidenced by the enhanced intensity of the exciton luminescence and by the decrease of the yellow luminescence is explained by the peculiarities of the anodic etching processing. en_US
dc.language.iso en en_US
dc.publisher American Institute of Physics en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject nanocolumns en_US
dc.subject anodic etching en_US
dc.subject epilayers en_US
dc.subject substrates en_US
dc.title Luminescence of GaN nanocolumns obtained by photon-assisted anodic etching en_US
dc.type Article en_US


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