Electrochemical Deposition by Design of Metal Nanostructures

MONAICO, Ed.; MONAICO, E. I.; URSAKI, V. V.; TIGINYANU, I. M.; NIELSCH, K.

dc.contributor.author	MONAICO, Ed.
dc.contributor.author	MONAICO, E. I.
dc.contributor.author	URSAKI, V. V.
dc.contributor.author	TIGINYANU, I. M.
dc.contributor.author	NIELSCH, K.
dc.date.accessioned	2020-10-27T12:19:19Z
dc.date.available	2020-10-27T12:19:19Z
dc.date.issued	2019
dc.identifier.citation	MONAICO, Ed,. MONAICO, E. I., URSAKI, V. V. et al. Electrochemical Deposition by Design of Metal Nanostructures. In: Surface Engineering and Applied Electrochemistry. 2019, V. 55, Iss. 4 p. 367-372. ISSN 1934-8002.	en_US
dc.identifier.uri	https://doi.org/10.3103/S1068375519040070
dc.identifier.uri	http://repository.utm.md/handle/5014/10909
dc.description	Access full text - https://doi.org/10.3103/S1068375519040070	en_US
dc.description.abstract	We report on the application of specially-designed masks for the purpose of electrochemical etching of InP single crystals which enables one to change in a controlled fashion the direction of propagation of pores, including those propagating in directions parallel to the top surface of substrates. The fabricated templates have been used to electrochemically deposit metallic nanostructures along predefined directions and to develop two-dimensional arrays of metallic nanotubes or nanowires embedded in semiconductor matrices.	en_US
dc.language.iso	en	en_US
dc.publisher	Springer Nature Switzerland	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	semiconductors	en_US
dc.subject	porous semiconductors	en_US
dc.subject	electroplating	en_US
dc.subject	nanodots	en_US
dc.subject	nanopores	en_US
dc.subject	electrodepositions	en_US
dc.title	Electrochemical Deposition by Design of Metal Nanostructures	en_US
dc.type	Article	en_US