Structural and electrical properties of (ZnO)k*Me2O3 (Me = Al, Ga, In) ceramics activated with halogens and zinc

Abstract

High-power magnetron sputtering is one of the most reproducible methods for the deposition of ZnO thin films with high structural perfection and low contamination level. The highest film quality requires homogeneous, highly thermally conductive ceramic targets, sintered at extremely high temperatures (1500 °C). Recently, a new lowtemperature method for sintering ZnO based on chemical vapor transport (CVT) has been proposed.