Imaging complex superimposed gratings by digital holographic microscopy

Abstract

This paper concerns holographic gratings recording on chalcogenide nanomultilayers (NML) of the composition As2S3–Se. Photosensitive NML of As2S3–Se and constituents films of As2S3, Se were prepared by a computer controlled cyclic thermal vacuum deposition through the mask. The NML sample contained alternating As2S3 and Se nanolayers with thickness of each nanolayer of 12 nm. Mass transport phenomenon is the physical process responsible for the formation of the surface relief on this material during interferometric laser inscription.