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Tailoring the surface topology, wettability, and optical bandgap of metal oxide films by means of tuning their compositions and technological conditions in spray pyrolysis
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| dc.contributor.author | URSAKI, V. | |
| dc.contributor.author | MORARI, V. | |
| dc.date.accessioned | 2026-10-13T05:51:14Z | |
| dc.date.available | 2026-10-13T05:51:14Z | |
| dc.date.issued | 2026 | |
| dc.identifier.citation | URSAKI, V. and V. MORARI. Tailoring the surface topology, wettability, and optical bandgap of metal oxide films by means of tuning their compositions and technological conditions in spray pyrolysis. In: 10th International Symposium on Dielectric Materials and Application, Abstract Book, ISyDMA’10, Chisinau, Republic of Moldova, 30 June -4 July, 2026. Technical University of Moldova. Chişinău: 2026, p. 23. | en_US |
| dc.identifier.uri | https://repository.utm.md/handle/5014/37313 | |
| dc.description.abstract | Oxide thin films with large band gaps offer a wealth of potential applications across various technological fields in energy, electronics, optoelectronics, and environmental technologies, due to their combination of unique optical and electronic properties. Microfluidics is another application filed of metal oxide films, when their wettability can be controlled. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Technical University of Moldova | en_US |
| dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
| dc.subject | metal oxide | en_US |
| dc.subject | solid solutions | en_US |
| dc.subject | composites | en_US |
| dc.subject | roughness | en_US |
| dc.subject | wettability | en_US |
| dc.subject | optical bandgap | en_US |
| dc.title | Tailoring the surface topology, wettability, and optical bandgap of metal oxide films by means of tuning their compositions and technological conditions in spray pyrolysis | en_US |
| dc.type | Article | en_US |
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10th International Symposium on Dielectric Materials and Applications (ISyDMA’10)
Chisinau, Republic of Moldova, June 30 - July 4, 2026
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 United States