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Oxygen-dependent formation of VO2 Thin Films by Metalorganic Aerosol Deposition
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| dc.contributor.author | BELENCHUK, A. | |
| dc.contributor.author | SHAPOVAL, O. | |
| dc.contributor.author | ZASAVITSKY, E. | |
| dc.contributor.author | VATAVU, S. | |
| dc.contributor.author | CHIRITA, A. | |
| dc.contributor.author | MOSHNYAGA, V. | |
| dc.date.accessioned | 2020-05-04T10:40:02Z | |
| dc.date.available | 2020-05-04T10:40:02Z | |
| dc.date.issued | 2018 | |
| dc.identifier.citation | BELENCHUK, A., SHAPOVAL, O., ZASAVITSKY, E.et al. Oxygen-dependent formation of VO2 Thin Films by Metalorganic Aerosol Deposition. In: Telecomunicaţii, Electronică şi Informatică: proc. of the 6th intern. conf., May 24-27, 2018. Chişinău, 2018, pp. 115-118. ISBN 978-9975-45-540-4. | en_US |
| dc.identifier.isbn | 978-9975-45-540-4 | |
| dc.identifier.uri | http://repository.utm.md/handle/5014/8062 | |
| dc.description.abstract | We report on the growth and properties of vanadium dioxide (VO2) on amorphous and oriented substrates by the low-cost and industry-oriented method of metalorganic aerosol deposition (MAD). X-ray diffraction and temperaturedependent Raman spectroscopy confirm formation of single phase tin films. Abrupt change of resistance by 5×103 times and steep drop of infrared transmission from 49 to 10% at 1700 nm pave the way for application of MAD technique in fabrication of VO2-based optoelectronic and thermochromic devices, such as “smart windows”. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Tehnica UTM | en_US |
| dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
| dc.subject | thin films | en_US |
| dc.subject | metalorganic aerosol depositions | en_US |
| dc.subject | surfaces morphology | en_US |
| dc.subject | crystal structures | en_US |
| dc.subject | spectroscopy | en_US |
| dc.subject | resistance switching | en_US |
| dc.subject | optical transmittance | en_US |
| dc.title | Oxygen-dependent formation of VO2 Thin Films by Metalorganic Aerosol Deposition | en_US |
| dc.type | Article | en_US |
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