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The impact of photothermal processing on TiO2 thin films properties
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| dc.contributor.author | SHISHIYANU, S. | |
| dc.contributor.author | ZARRELLI, M. | |
| dc.contributor.author | STRATAN, Gh. | |
| dc.contributor.author | VARTIC, V. | |
| dc.contributor.author | GIORDANO, M. | |
| dc.contributor.author | SHISHIYANU, T. | |
| dc.date.accessioned | 2019-12-04T09:49:21Z | |
| dc.date.available | 2019-12-04T09:49:21Z | |
| dc.date.issued | 2012 | |
| dc.identifier.citation | SHISHIYANU, S., ZARRELLI, M., STRATAN, Gh. et al. The impact of photothermal processing on TiO2 thin films properties. In: Telecommunications, Electronics and Informatics- ICTEI 2012: proc. of the 5th intern. conf., Technical University of Moldova, May 11-13, 2012. Chișinău, 2012, Vol. 1, pp. 63-66. ISBN 978-9975-45-082-9. | en_US |
| dc.identifier.isbn | 978-9975-45-082-9 | |
| dc.identifier.uri | http://repository.utm.md/handle/5014/7234 | |
| dc.description.abstract | In this paper we present our experimental results concerning the fabrication of TiO2 thin films by spray pyrolysis deposition method onto different substrates – Corning glass, Si, SiO2 and optical fibers. The surface morphology of the TiO2 thin films have been investigated by Atomic Force Microscopy. Raman shift spectra measurements have been done for the optical characterization of the fabricated titania thin films. The post-growth rapid photothermal processing (RPP) at temperatures of 100-800°C for 1-2 min have been applied. Our experimental results prove that by the application of postgrowth RPP is possible to essentially improve the crystallinity of the deposited TiO2 films. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Technical University of Moldova | en_US |
| dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
| dc.subject | thin films | en_US |
| dc.subject | pyrolysis | en_US |
| dc.subject | photothermal processing | en_US |
| dc.title | The impact of photothermal processing on TiO2 thin films properties | en_US |
| dc.type | Article | en_US |
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