Nanocrystalline and amorphous tellurium films for gas sensing applications

TSIULYANU, D.; MOCREAC, O.; AFANASIEV, A.

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dc.contributor.author	TSIULYANU, D.
dc.contributor.author	MOCREAC, O.
dc.contributor.author	AFANASIEV, A.
dc.date.accessioned	2019-11-03T19:50:10Z
dc.date.available	2019-11-03T19:50:10Z
dc.date.issued	2019
dc.identifier.citation	TSIULYANU, D., MOCREAC, O., AFANASIEV, A. Nanocrystalline and amorphous tellurium films for gas sensing applications. In: Amorphous and Nanostructured Chalcogenides. Abstract Book: proc. of the 9th International Conference, 30 June – 4 July, 2019. Chişinău, 2019, pp. 34-35.	en_US
dc.identifier.uri	http://repository.utm.md/handle/5014/5959
dc.description	Abstract	en_US
dc.description.abstract	Microstructural peculiarities and gas (NO2) sensing properties of tellurium thin films dependent on the technological procedures of their physical grow are presented. The fabrication of the films was provided using thermal vacuum evaporation method but the investigation were focused to establish the interdependence between the technological conditions of their growth process and both structure / morphology and gas sensing properties. Tellurium (purity 99.999 %) based thin films have been prepared using different grow rates (10 - 40 nm/s) onto Pyrex glass, sintered alumina (Al2O3) or Si/SiO2 substrates.	en_US
dc.language.iso	en	en_US
dc.publisher	Tehnica UTM	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	tellurium films	en_US
dc.subject	gas sensing	en_US
dc.subject	thin films	en_US
dc.title	Nanocrystalline and amorphous tellurium films for gas sensing applications	en_US
dc.type	Article	en_US