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Investigation of Mesoporous Structures for Thermoelectric Applications

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dc.contributor.author COJOCARU, A.
dc.contributor.author CARSTENSEN, J.
dc.contributor.author BOOR, J.
dc.contributor.author SCHMIDT, V.
dc.contributor.author FÖLL, H.
dc.date.accessioned 2019-10-22T10:00:52Z
dc.date.available 2019-10-22T10:00:52Z
dc.date.issued 2011
dc.identifier.citation COJOCARU, A., CARSTENSEN, J., BOOR, J. et al. Investigation of Mesoporous Structures for Thermoelectric Applications. In: ICNBME-2011. International conference on Nanotechnologies and Biomedical Engineering. German-moldovan workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the intern. conf., July 7-8, 2011. Chişinău, 2011, pp. 21-23. ISBN 978-9975-66-239-0. en_US
dc.identifier.isbn 978-9975-66-239-0
dc.identifier.uri http://repository.utm.md/handle/5014/4995
dc.description.abstract Mesoporous silicon is an attractive material for thermoelectric application. For pore wall thicknesses around <100nm, phonons can not penetrate the porous layer while electrons still can, due to there smaller mean free path length. The resulting good electrical and bad thermal conductivity is a premise for efficient thermoelectric devices. This paper presents results regarding homogeneity, high porosity, and optimal pore wall thicknesses for porous silicon based thermoelectric devices. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject electrochemical etching en_US
dc.subject mesoporous silicon en_US
dc.subject thermoelectric applications en_US
dc.title Investigation of Mesoporous Structures for Thermoelectric Applications en_US
dc.type Article en_US


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