KOLKOVSKY, Vl.; STÜBNER, R.; LANGA, S.; WENDE, U.; KAISER, B.; CONRAD, H.; SCHENK, H.
(ELSEVIER, 2016)
In the present study the electrical properties of 100nm and 400nm alumina films grown by the atomic layer deposition technique on p-type Si before and after a post-deposition annealing at 440°C and after a dc H plasma ...