Gas sensing characterization of tellurium thin films by Kelvin probe technique

TSIULYANU, D.; MARIAN, S.; MOCREAC, O.

dc.contributor.author	TSIULYANU, D.
dc.contributor.author	MARIAN, S.
dc.contributor.author	MOCREAC, O.
dc.date.accessioned	2020-09-08T09:14:26Z
dc.date.available	2020-09-08T09:14:26Z
dc.date.issued	2012
dc.identifier.citation	TSIULYANU, D., MARIAN, S., MOCREAC, O. Gas sensing characterization of tellurium thin films by Kelvin probe technique. In: Materials Science and Condensed Matter Physics: mater. a 6-a conf. intern., 11-14 septembrie, 2012. Chişinău, 2012, p. 122. ISBN 978-9975-66-290-1.	en_US
dc.identifier.isbn	978-9975-66-290-1
dc.identifier.uri	http://repository.utm.md/handle/5014/9287
dc.description	Sursa: Conferința –"Materials Science and Condensed Matter Physics", Chișinău, Moldova, 11-14 septembrie 2012.→ https://ibn.idsi.md/collection_view/483	en_US
dc.description.abstract	In this paper, the change of work function ( Δφ ) of the tellurium thin films was studied in response to different concentrations of nitrogen dioxide, carbon oxide, ozone and water vapor using a KP with a gold grid reference electrode. In all experiments, the relative change of work function was determined at room temperature.	en_US
dc.language.iso	en	en_US
dc.publisher	Institutul de Fizică Aplicată al AŞM	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	tellurium thin films	en_US
dc.subject	thin films	en_US
dc.subject	films	en_US
dc.subject	nitrogen dioxide	en_US
dc.subject	carbon oxide	en_US
dc.subject	ozone	en_US
dc.subject	water vapor	en_US
dc.title	Gas sensing characterization of tellurium thin films by Kelvin probe technique	en_US
dc.type	Article	en_US