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Rapid photothermal processing for functionalization of nanostructured thin films

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dc.contributor.author SHISHIYANU, S.
dc.contributor.author URSAKI, V. V.
dc.contributor.author GHIMPU, L.
dc.contributor.author LUPAN, O.
dc.contributor.author TIGINYANU, I.
dc.contributor.author SHISHIYANU, T.
dc.date.accessioned 2020-08-28T08:34:05Z
dc.date.available 2020-08-28T08:34:05Z
dc.date.issued 2011
dc.identifier.citation SHISHIYANU, S., URSAKI, V. V., GHIMPU, L. Rapid photothermal processing for functionalization of nanostructured thin films. In: International Semiconductor Conference: proc. CAS 2011, 17-19 Oct. 2011, Sinaia, Romania, 2011, V. 2, pp. 245-248. ISBN: 978-1-61284-172-4. en_US
dc.identifier.isbn 978-1-61284-172-4
dc.identifier.uri http://repository.utm.md/handle/5014/9135
dc.description Access ful text: https://doi.org/10.1109/SMICND.2011.6095782 en_US
dc.description.abstract A rapid photothermal processing (RPP) technique has been developed to functionalize a new generation of nanostructured zinc oxide film materials. An environment-friendly chemical process was used to obtain nanostructures. The post-growth RPP at 650°C in N2 atmosphere of the nanostructured zinc oxide films leads to the suppression of deep-defect-level emission, improvement of near-band edge emission and was ascribed to the decrease of the structure defects compared to the initial nanostructures. The sensitivity of the nanostructured zinc oxide films to 100 ppm ammonia for the operation temperatures between 20°C and 300°C was essentially improved by RPP. en_US
dc.language.iso en en_US
dc.publisher Institute of Electrical and Electronics Engineerings, IEEE en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject crystal defects en_US
dc.subject crystals en_US
dc.subject deep levels en_US
dc.subject semiconductors en_US
dc.subject depositions en_US
dc.subject nanofabrication en_US
dc.subject nanostructured materials en_US
dc.subject photoluminescence en_US
dc.subject photothermal effects en_US
dc.subject Raman spectra en_US
dc.subject semiconductor thin films en_US
dc.subject wide band gap semiconductors en_US
dc.subject zinc compounds en_US
dc.subject photothermal processing en_US
dc.subject nanostructured thin films en_US
dc.subject deep-defect-level emission en_US
dc.subject near-band edge emission en_US
dc.subject emissions en_US
dc.subject ammonia en_US
dc.subject zinc oxide en_US
dc.subject thin films en_US
dc.subject films en_US
dc.subject nanostructures en_US
dc.subject temperature sensors en_US
dc.subject annealing en_US
dc.subject chemical growth en_US
dc.title Rapid photothermal processing for functionalization of nanostructured thin films en_US
dc.type Article en_US


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