Sensing Properties of Ultra-Thin TiO2 Nanostructured Films Based Sensors

Abstract

In this work, ultra-thin TiO2 nanostructured films, synthesized by atomic layer deposition method (ALD), were integrated in sensor structures. The effect of post-growth annealing and thickness of TiO2 samples on UV and hydrogen gas sensing properties is investigated. An increase in current value of more than one order of magnitude (IUVON/IUVOFF~38) has been detected under exposure to UV light (365 nm) of sample with 45 nm thickness and annealed in furnace at 650 0C for 2 hours. Samples with 15 nm thickness and rapid thermal annealed at 450 0C for 3 min, have shown hydrogen gas response (~3.75).