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Analysis of the Behavior of PVDF Layers Deposited under Various Conditions

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dc.contributor.author COJOCARU, Victor
dc.contributor.author KATASHEV, Alexei
dc.contributor.author TEODORESCU, Horia-Nicolai
dc.date.accessioned 2019-10-23T07:59:33Z
dc.date.available 2019-10-23T07:59:33Z
dc.date.issued 2011
dc.identifier.citation COJOCARU, Victor, KATASHEV, Alexei, TEODORESCU, Horia-Nicolai. Analysis of the Behavior of PVDF Layers Deposited under Various Conditions. In: ICNBME-2011. International conference on Nanotechnologies and Biomedical Engineering. German-moldovan workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the intern. conf., July 7-8, 2011. Chişinău, 2011, pp. 80-82. ISBN 978-9975-66-239-0. en_US
dc.identifier.isbn 978-9975-66-239-0
dc.identifier.uri http://repository.utm.md/handle/5014/5055
dc.description.abstract We analyze the surface and piezoelectric properties of PVDF films deposited on the surface of Si wafer by solution casting under various conditions of temperature and electric field. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject PVDF layers en_US
dc.subject PVDF films en_US
dc.subject films en_US
dc.title Analysis of the Behavior of PVDF Layers Deposited under Various Conditions en_US
dc.type Article en_US


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