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Effect of rapid photothermal processing on the C-V characteristics of anodic SiO2 films

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dc.contributor.author ŞIŞIANU, Teodor
dc.contributor.author SONTEA, Victor
dc.contributor.author ŞIŞIANU, Sergiu
dc.contributor.author LUPAN, Oleg
dc.contributor.author POCAZNOI, Ion
dc.contributor.author RAILEAN, Serghei
dc.date.accessioned 2019-10-16T09:10:40Z
dc.date.available 2019-10-16T09:10:40Z
dc.date.issued 2005
dc.identifier.citation ŞIŞIANU, Teodor, ŞONTEA, Victor, ŞIŞIANU, Sergiu et al. Effect of rapid photothermal processing on the C-V characteristics of anodic SiO2 films. In: Microelectronics and Computer Science: proc. of the 4th intern. conf., September 15-17, 2005. Chişinău, 2005, vol. 1, pp. 32-35. ISBN 9975-66-038-X. en_US
dc.identifier.isbn 9975-66-038-X
dc.identifier.uri http://repository.utm.md/handle/5014/4712
dc.description.abstract The effect of rapid photothermal processing (RPP) in nitrogen on anodic SiO2 for high quality oxide preparation in terms of gate dielectrics in thin film transistors is reported. Samples prepared by anodic oxidation of silicon in different pre-oxidation and oxidation conditions, and RPP have been used for characterization of SiO2 thin film devices. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject anodic oxidation en_US
dc.subject films en_US
dc.subject rapid photothermal processing en_US
dc.subject interface traps en_US
dc.title Effect of rapid photothermal processing on the C-V characteristics of anodic SiO2 films en_US
dc.type Article en_US


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