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Nanoporous Zinc Oxide Films Prepared by Magnetron Sputtering

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dc.contributor.author GHIMPU, L.
dc.contributor.author LUPAN, O.
dc.contributor.author POPESCU, L.
dc.contributor.author TIGINYANU, I. M.
dc.date.accessioned 2019-10-15T08:40:55Z
dc.date.available 2019-10-15T08:40:55Z
dc.date.issued 2011
dc.identifier.citation GHIMPU, L., LUPAN, O., POPESCU, L. et al. Nanoporous Zinc Oxide Films Prepared by Magnetron Sputtering. In: ICNBME-2011. International conference on Nanotechnologies and Biomedical Engineering. German-moldovan workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the intern. conf., July 7-8, 2011. Chişinău, 2011, pp. 138-141. ISBN 978-9975-66-239-0. en_US
dc.identifier.isbn 978-9975-66-239-0
dc.identifier.uri http://repository.utm.md/handle/5014/4681
dc.description.abstract In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject nanoporous semiconductors en_US
dc.subject films en_US
dc.subject magnetron sputtering en_US
dc.title Nanoporous Zinc Oxide Films Prepared by Magnetron Sputtering en_US
dc.type Article en_US


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