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Evidence for the Concentration Induced Extinction of Gas Sensitivity in Amorphous and Nanostructured Te Thin Films

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dc.contributor.author TSIULYANU, D.
dc.contributor.author MOCREAC, O.
dc.contributor.author ENACHI, M.
dc.contributor.author VOLODINA, G.
dc.date.accessioned 2019-10-07T08:57:31Z
dc.date.available 2019-10-07T08:57:31Z
dc.date.issued 2013
dc.identifier.citation TSIULYANU, D., MOCREAC, O., ENACHI, M. et al. Evidence for the Concentration Induced Extinction of Gas Sensitivity in Amorphous and Nanostructured Te Thin Films. In: ICNBME-2013. International Conference on Nanotechnologies and Biomedical Engineering. German-Moldovan Workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the 2th intern. conf., April 18-20, 2013. Chişinău, 2013, pp. 222-226. ISBN 978-9975-62-343-8. en_US
dc.identifier.isbn 978-9975-62-343-8
dc.identifier.uri http://repository.utm.md/handle/5014/4624
dc.description.abstract The extinction of sensitivity to nitrogen dioxide induced by high gas concentration have been observed in ultrathin tellurium films. The phenomenon becomes apparent in both continuous and nanostructured films shown by AFM, SEM and XRD analyses to be in amorphous state. Sensitivity of 30 nm thickness Te film decreases near linearly with concentration increase between 150 and 500 ppb of nitrogen dioxide. The results are explained in terms of formation of a nitrogen dioxide catalytic gate in which a molecule adsorbs (and desorbs) without reacting. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject thin films en_US
dc.subject amorphous films en_US
dc.subject nanostructured films en_US
dc.subject films en_US
dc.subject pelicule subțiri en_US
dc.subject pelicule amorfe en_US
dc.subject pelicule nanostructurate en_US
dc.title Evidence for the Concentration Induced Extinction of Gas Sensitivity in Amorphous and Nanostructured Te Thin Films en_US
dc.type Article en_US


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