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Controlled Electroplating of Noble Metals on III-V Semiconductor Nanotemplates Fabricated by Anodic Etching of Bulk Substrates

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dc.contributor.author MONAICO, Elena I.
dc.contributor.author MONAICO, Eduard V.
dc.contributor.author URSAKI, Veaceslav V.
dc.contributor.author TIGINYANU, Ion M.
dc.date.accessioned 2023-11-23T07:50:06Z
dc.date.available 2023-11-23T07:50:06Z
dc.date.issued 2022
dc.identifier.citation MONAICO, Elena I. et al. Controlled Electroplating of Noble Metals on III-V Semiconductor Nanotemplates Fabricated by Anodic Etching of Bulk Substrates. In: Coatings. 2022, vol. 12, nr. 10, article-number 1521. ISSN 2079-6412. en_US
dc.identifier.issn 2079-6412
dc.identifier.uri https://doi.org/10.3390/coatings12101521
dc.identifier.uri http://repository.utm.md/handle/5014/24975
dc.description.abstract Porous templates are widely used for the preparation of various metallic nanostructures. Semiconductor templates have the advantage of controlled electrical conductivity. Site-selective deposition of noble metal formations, such as Pt and Au nanodots and nanotubes, was demonstrated in this paper for porous InP templates prepared by the anodization of InP wafers. Metal deposition was performed by pulsed electroplating. The produced hybrid nanomaterials were characterized by scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX). It was shown that uniform deposition of the metal along the pore length could be obtained with optimized pulse parameters. The obtained results are discussed in terms of the optimum conditions for effective electrolyte refreshing and avoiding its depletion in pores during the electroplating process. It was demonstrated that the proposed technology could also be applied for the preparation of metal nanostructures on porous oxide templates, when it is combined with thermal treatment for the oxidation of the porous semiconductor skeleton. en_US
dc.language.iso en en_US
dc.publisher MDPI (Basel, Switzerland) en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject pulsed electrodeposition en_US
dc.subject nanotubes en_US
dc.subject nanodots en_US
dc.subject porous template en_US
dc.subject varicap devices en_US
dc.subject site-selective deposition en_US
dc.title Controlled Electroplating of Noble Metals on III-V Semiconductor Nanotemplates Fabricated by Anodic Etching of Bulk Substrates en_US
dc.type Article en_US


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