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Patterning Nanoelectronic Devices Using Field Emission Scanning Electron Microscope

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dc.contributor.author DINESCU, Adrian
dc.contributor.author DRAGOMAN, Mircea
dc.contributor.author AVRAM, Andrei
dc.contributor.author DRAGOMAN, Daniela
dc.date.accessioned 2023-11-06T09:58:11Z
dc.date.available 2023-11-06T09:58:11Z
dc.date.issued 2023
dc.identifier.citation DINESCU, Adrian, DRAGOMAN, Mircea, AVRAM, Andrei et al. Patterning Nanoelectronic Devices Using Field Emission Scanning Electron Microscope. In: 6th International Conference on Nanotechnologies and Biomedical Engineering: proc. of ICNBME-2023, 20–23, 2023, Chisinau, vol. 1: Nanotechnologies and Nano-biomaterials for Applications in Medicine, 2023, p. 278-283. ISBN 978-3-031-42774-9. e-ISBN 978-3-031-42775-6. en_US
dc.identifier.isbn 978-3-031-42774-9
dc.identifier.isbn 978-3-031-42775-6
dc.identifier.uri https://doi.org/10.1007/978-3-031-42775-6_31
dc.identifier.uri http://repository.utm.md/handle/5014/24641
dc.description Acces full text - https://doi.org/10.1007/978-3-031-42775-6_31 en_US
dc.description.abstract Many advances in fabrication processes at micro and nanoscale in the past two decades were possible due to scanning electron microscopy, which is now an indispensable tool for analyzing and fabricating new nanostructures and nanomaterials. The development of very efficient in-lens detectors for SEM and the capability to use low energy electron probes are the gateway to the revelation of new features and new properties of nanomaterials that have been hidden by the use of high accelerating voltages and large interaction of volume, in the high-resolution SEM. Electron beams have been used for lithography for decades and pattern generators can be fitted to all modern SEMs, converting them in very powerful nanolithographic tools, without degrading or limiting their imaging capabilities. The SEM became a very versatile tool for micro and nanofabrication, the same equipment used for fabrication being used to view the resulting nanostructures. Electron Beam Lithography (EBL) is one of the highest resolution lithographic technologies and a key technique for fabrication of nanoelectronic devices, allowing direct patterning of structures with critical dimensions down to 10 nm [1]. Apart of resolution, a very important point of EBL is that it can be easily implemented in a research laboratory by converting a scanning electron microscope (SEM) for lithography with an external pattern generator. To illustrate the patterning capabilities of electron microscopy, in this review we describe the EBL based fabrication processes of some nano-devices like field effect transistors on graphene and other 2D materials. en_US
dc.language.iso en en_US
dc.publisher Springer Nature Switzerland en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject nanoelectronic devices en_US
dc.subject patterning en_US
dc.subject electron microscope en_US
dc.subject electron beam lithography en_US
dc.title Patterning Nanoelectronic Devices Using Field Emission Scanning Electron Microscope en_US
dc.type Article en_US


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  • 2023
    6th International Conference on Nanotechnologies and Biomedical Engineering, September 20–23, 2023, Chisinau, Moldova

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Attribution-NonCommercial-NoDerivs 3.0 United States Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 United States

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