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Fabrication of ultrathin GaN membranes with relatively large sizes for practical applications

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dc.contributor.author CIOBANU, Vladimir
dc.contributor.author BRANISTE, Tudor
dc.contributor.author POPA, Veaceslav
dc.contributor.author GRIDENCO, Oleg
dc.contributor.author BATIRI, Mihail
dc.contributor.author TIGINYANU, Ion
dc.date.accessioned 2022-05-13T08:22:16Z
dc.date.available 2022-05-13T08:22:16Z
dc.date.issued 2015
dc.identifier.citation CIOBANU, Vladimir, BRANISTE, Tudor, POPA, Veaceslav et al. Fabrication of ultrathin GaN membranes with relatively large sizes for practical applications. In: Science and Society- the Use of Light: Workshop în cadrul conf. ICNBME - International Conference on Nanotechnologies and Biomedical Engineering, 24-25 Sept, 2015, Chişinău, Republic of Moldova: Abstracts, 2015, p. 24. en_US
dc.identifier.uri http://repository.utm.md/handle/5014/20270
dc.description Only Abstract
dc.description.abstract We propose for the implementation a cost effective technological route allowing one to fabricate ultrathin GaN membranes for sensor applications. The main efforts are focused on the design and development of active parts of sensor devices. Our approach is based on the modified version of previously proposed Surface Charge Lithography. In achieving the main goal, several technological steps were involved such as ion treatment of the surface in a controlled manner and photoelectrochemical etching process. As a result, by choosing the right parameters of the Ar+ plasma treatment, mask design, and etching conditions, we demonstrate the possibility to fabricate relatively large, ultrathin, continuous GaN membranes directly connected to Ohmic contacts on bulk GaN. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject gallium nitride membranes en_US
dc.subject ultrathin membranes en_US
dc.subject sensor applications en_US
dc.subject ion treatment en_US
dc.subject photoelectrochemical etching en_US
dc.subject etching en_US
dc.title Fabrication of ultrathin GaN membranes with relatively large sizes for practical applications en_US
dc.type Article en_US


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