Browsing by Author "VAHL, A."

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  • ABABII, N.; ULFA, M.; HOPPE, M.; VAHL, A. (Tehnica UTM, 2019)
    Cererile ridicate de aplicații pentru senzori de înaltă performanță indică importanța controlului precis al parametrilor oxizilor semiconductori. Pentru a îmbunătăți aceste performanțe prezentăm în lucrarea dată pelicule ...
  • GRONENBERG, O.; CARSTENS, N.; VAHL, A.; FAUPEL, F.; KIENLE, L. (Tehnica UTM, 2019)
    Memristors are promising candidates for new memory technologies and are capable to mimic neural networks. The switching in memristive devices occurs typically in few nanometer thin oxide layers. The direct observation of ...
  • VAHL, A.; DITTMANN, J.; JETTER, J.; VEZIROGLU, S.; SHREE, S.; ABABII, N.; LUPAN, O.; AKTAS, O. C.; STRUNSKUS, T.; QUANDT, E.; ADELUNG, R.; SHARMA, S. K.; FAUPEL, F. (IOP Publishing Ltd, 2019)
    Morphology is a critical parameter for various thin film applications, influencing properties like wetting, catalytic performance and sensing efficiency. In this work, we report on the impact of oxygen partial flow on the ...
  • POLONSKYI, Oleksandr; VAHL, A.; DREWES, J.; HINZ, A.; STRUNSKUS, T.; ABABII, N.; REIMER, T.; CHEMNITZ, S.; LUPAN, O.; ADELUNG, R.; FAUPEL, F. (Sumy State University, 2018)
    In this paper, we report on a recent progress in formation and deposition of NPs by the gas aggregation method. Examples range from noble (Au, Ag), through reactive (Al) to more advanced core-shell nanostructures [4]. The ...

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